Abstract
Mechanical characteristics of UV curable resist for UV nanoimprint lithography are investigated using UV rheology meter. Modulations of visco-elatic properties and thickness shrinkages in typical resists are evaluated in variation of exposure UV intensity. The mechanical modulation speed of the resist depends on the UV intensity, which affects to throughput of UV nanoimprint lithography process. To handle the characteristics universally, effective conversion time is newly introduced, which fairly expresses the resist modifications. © 2010 CPST.
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Suzuki, R., Sakai, N., Sekiguchi, A., Matsumoto, Y., Tanaka, R., & Hirai, Y. (2010). Evaluation of curing characteristics in UV-NIL resist. Journal of Photopolymer Science and Technology, 23(1), 51–54. https://doi.org/10.2494/photopolymer.23.51
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