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Nano-patterning by pulsed laser irradiation in near field

Journal of Physics: Conference Series (2007) 59(1) 64-67
DOI: 10.1088/1742-6596/59/1/014
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Abstract

Pulsed laser irradiation in near field is one of effective ways to break optical diffraction limit for surface nano-structuring. Femtosecond laser (400 nm, 100 fs) irradiation through near-field scanning optical microscopy for sub-50 nm resolution is studied. Application of transparent particles' mask by the self-assembly for nano-hole array fabrication is also investigated. It is attributed to light enhancement in near field through the particles. © 2007 IOP Publishing Ltd.

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CITATION STYLE

APA

Hong, M. H., Lin, Y., Chen, G. X., Tan, L. S., Xie, Q., Lukyanchuk, B., … Chong, T. C. (2007). Nano-patterning by pulsed laser irradiation in near field. Journal of Physics: Conference Series, 59(1), 64–67. https://doi.org/10.1088/1742-6596/59/1/014

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