Mono-and multilayer formation by diazonium reduction on carbon surfaces monitored with atomic force microscopy "scratching"

Abstract

Contact mode atomic force microscopy (AFM) was used to intentionally scratch a monolayer deposited on a pyrolyzed photoresist film (PPF). The force was set to completely remove the monolayer but not to damage the underlying PPF surface. A line profile determined across the scratch with tapping mode AFM permitted determination of the monolayer thickness from the depth of the scratch. A statistical process was devised to avoid user bias in determining the monolayer thickness and was used to determine the thickness as a function of derivatization parameters. PPF surfaces modified by reduction of diazonium ions of stilbene, biphenyl, nitrobiphenyl, terphenyl, and nitroazobenzene (NAB) were scratched and their modification layer thicknesses determined. For single-scan derivatizations of 1 mM diazonium ions to -0.6 V versus Ag+/Ag, the biphenyl and stilbene monolayers exhibited thicknesses close to those expected for true monolayers. However, more extensive derivatization resulted in multilayers up to 6.3 nm thick for the case of NAB. Such multilayers imply that electrons are transmitted through the growing film during diazonium reduction, despite the fact that electron tunneling would not be expected to be operative over such long distances. The results are consistent with a conductance increase in the growing film, which yields a partially conductive layer that can support further diazonium ion reduction and additional layer growth.