ALD: Atomic Layer Deposition, Precise and Conformal Coating for Better Performance

Abstract

Atomic layer deposition (ALD)Atomic layer deposition (ALD)is a thin-film growth technology that is capable of depositing conformal, pinhole-free, and uniform films on high-aspect-ratio surfaces with atomic precision. It is similar to chemical vapor deposition (CVD), but compared to CVD, it usually produces thin films with better mechanical, thermal, and electrical properties. ALD is a rapidly growing field, and it is currently introduced in the semiconductor and solar cell industries.